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Title: Effect of RF magnetron sputtering conditions on microstructure and X-ray characteristics of yttria-stabilized zirconia thin films = Wpływ warunków sputeringu magnetronowego na mikrostrukturę i charakterystykę rentgenowską cienkich warstw dwutlenku cyrkonu stabilizowanego tlenkiem itru

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Last modified:

Oct 2, 2020

In our library since:

Oct 15, 2012

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https://rcin.org.pl./publication/14925

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