Title:

Effect of RF magnetron sputtering conditions on microstructure and X-ray characteristics of yttria-stabilized zirconia thin films = Wpływ warunków sputeringu magnetronowego na mikrostrukturę i charakterystykę rentgenowską cienkich warstw dwutlenku cyrkonu stabilizowanego tlenkiem itru

Subtitle:

Materiały Elektroniczne 1996 T.24 nr 2/3

Creator:

Tomaszewski Henryk

Contributor:

Haemers Johan ; De Roo Nico ; De Gryse Roger

Publisher:

ITME

Place of publishing:

Warszawa

Date issued/created:

1996

Description:

32-42 s. : il. ; 24 cm. ; Bibliogr. s. 41

Subject and Keywords:

Electronic - materials ; Electronic - journal - materials ; magnetron sputtering ; YSZ ; XRD

Relation:

Electronic Materials

Volume:

24

Issue:

2/3

Start page:

32

End page:

42

Resource type:

Text

Detailed Resource Type:

Article

Format:

application/pdf

Source:

ITME, sygn. dostępny ; click here to follow the link

Language:

eng

Rights:

Rights Reserved - Free Access

Terms of use:

Copyright-protected material. May be used within the limits of statutory user freedoms

Digitizing institution:

Institute of Electronic Materials Technology

Original in:

Library of the Electronic Materials Technology Institute

Projects co-financed by:

Programme Innovative Economy, 2010-2014, Priority Axis 2. R&D infrastructure ; European Union. European Regional Development Fund

Access:

Open