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Materiały Elektroniczne 2011 T.39 nr 2
Bibliogr. s. 23 ; 18-23 s. : il. 30 cm.
ITME, sygn. dostępny ; click here to follow the link
Copyright-protected material. May be used within the limits of statutory user freedoms
Institute of Electronic Materials Technology
Library of the Electronic Materials Technology Institute
Programme Innovative Economy, 2010-2014, Priority Axis 2. R&D infrastructure ; European Union. European Regional Development Fund
Oct 2, 2020
May 15, 2013
1629
https://rcin.org.pl./publication/17039
Edition name | Date |
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Stańczyk Beata, 2011, Otrzymywanie warstw SiCN metoda RF sputteringu | Oct 2, 2020 |