Title:

Wpływ parametrów technologicznych na właściwości epitaksjalnych warstw węglowych osadzanych z fazy gazowej na podłożach krzemowych = Effect of technological parameters on the properties of carbon epitaxial layers deposited from the GaS phase on silicon substrates

Subtitle:

Materiały Elektroniczne 2004 T.32 nr 1/4

Creator:

Żelazko Jarosław

Publisher:

ITME

Place of publishing:

Warszawa

Date issued/created:

2004

Description:

36-48 s. : il. 24 cm. ; Bibliogr. s. 48

Subject and Keywords:

carbon epitaxial layer ; RFCVD ; Electronic - materials ; Electronic - journal - materials

Relation:

Electronic Materials

Volume:

32

Issue:

1/4

Start page:

36

End page:

48

Resource type:

Text

Detailed Resource Type:

Article

Format:

application/pdf

Source:

ITME, sygn. dostępny ; click here to follow the link

Language:

pol

Rights:

Rights Reserved - Free Access

Terms of use:

Copyright-protected material. May be used within the limits of statutory user freedoms

Digitizing institution:

Institute of Electronic Materials Technology

Original in:

Library of the Electronic Materials Technology Institute

Projects co-financed by:

Programme Innovative Economy, 2010-2014, Priority Axis 2. R&D infrastructure ; European Union. European Regional Development Fund

Access:

Open